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Henry, M. David and Welch, Colin and Scherer, Axel (2009) Techniques of cryogenic reactive ion etching in silicon for fabrication of sensors. Journal of Vacuum Science and Technology A, 27 (5). pp. 1211-1216. ISSN 0734-2101. http://resolver.caltech.edu/CaltechAUTHORS:20090923-143135056

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