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Hwang, Gyeong S. and Goddard, William A., III (2003) Shouldering in B diffusion profiles in Si: Role of di-boron diffusion. Applied Physics Letters, 83 (17). pp. 3501-3503. ISSN 0003-6951. doi:10.1063/1.1619219. https://resolver.caltech.edu/CaltechAUTHORS:HWAapl03b

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