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Hwang, Gyeong S. and Giapis, Konstantinos P. (1999) Role of film conformality in charging damage during plasma-assisted interlevel dielectric deposition. Journal of Vacuum Science and Technology B, 17 (3). pp. 999-1002. ISSN 1071-1023. doi:10.1116/1.590683. https://resolver.caltech.edu/CaltechAUTHORS:HWAjvstb99

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