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Lo, Hsi-wen and Kuo, Wen-Cheng and Yang, Yao-Joe et al. (2008) Recrystallized parylene as a mask for silicon chemical etching. In: 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems. IEEE , Piscataway, NJ, pp. 842-845. ISBN 978-1-4244-1907-4 . http://resolver.caltech.edu/CaltechAUTHORS:20100721-152410514

This list was generated on Tue Oct 17 06:27:31 2017 PDT.