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Bai, Gang and Nicolet, Marc-A. and Vreeland, Thad, Jr. et al. (1989) Strain in epitaxial CoSi2 films on Si (111) and inference for pseudomorphic growth. Applied Physics Letters, 55 (18). pp. 1874-1876. ISSN 0003-6951. doi:10.1063/1.102327. https://resolver.caltech.edu/CaltechAUTHORS:BAIapl89

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