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Gasser, S. M. and Ruiz, R. and Kolawa, E. et al. (1999) Instability of Amorphous Ru-Si-O Thin Films under Thermal Oxidation. Journal of the Electrochemical Society, 146 (4). pp. 1546-1548. ISSN 0013-4651. http://resolver.caltech.edu/CaltechAUTHORS:GASjes99

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