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Reid, J. S. and Kolawa, E. and Garland, C. M. et al. (1996) Amorphous (Mo, Ta, or W)–Si–N diffusion barriers for Al metallizations. Journal of Applied Physics, 79 (2). pp. 1109-1117. ISSN 0021-8979. http://resolver.caltech.edu/CaltechAUTHORS:REIjap96

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