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Tsai, C. J. and Vreeland, T., Jr. and Atwater, H. A. (1992) Defect formation and diffusion mechanism in ion-assisted molecular-beam epitaxy. Physical Review B, 46 (11). pp. 7103-7109. ISSN 0163-1829. doi:10.1103/PhysRevB.46.7103. https://resolver.caltech.edu/CaltechAUTHORS:TSAprb92

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