A Caltech Library Service

Browse by Eprint ID

Up a level
Export as [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Number of items: 1.

Kacsich, T. and Kolawa, E. and Fleurial, J. P. et al. (1998) Films of Ni–7 at% V, Pd, Pt and Ta–Si–N as diffusion barriers for copper on Bi2Te3. Journal of Physics D: Applied Physics, 31 (19). pp. 2406-2411. ISSN 0022-3727.

This list was generated on Tue Dec 6 17:05:42 2022 UTC.