A Caltech Library Service

Browse by Eprint ID

Up a level
Export as [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Number of items: 1.

Kolawa, E. and Chen, J. S. and Reid, J. S. et al. (1991) Tantalum-based diffusion barriers in Si/Cu VLSI metallizations. Journal of Applied Physics, 70 (3). pp. 1369-1373. ISSN 0021-8979. doi:10.1063/1.349594.

This list was generated on Tue Oct 4 19:41:48 2022 UTC.