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Hwang, Gyeong S. and Giapis, Konstantinos P. (1997) The influence of electron temperature on pattern-dependent charging during etching in high-density plasmas. Journal of Applied Physics, 81 (8). pp. 3433-3439. ISSN 0021-8979. doi:10.1063/1.365039. https://resolver.caltech.edu/CaltechAUTHORS:HWAjap97c

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