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Hwang, Gyeong S. and Giapis, Konstantinos P. (1997) The influence of mask thickness on charging damage during overetching. Journal of Applied Physics, 82 (2). pp. 572-577. ISSN 0021-8979. doi:10.1063/1.365617. https://resolver.caltech.edu/CaltechAUTHORS:HWAjap97a

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