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Hwang, Gyeong S. and Giapis, Konstantinos P. (1997) Simulation of current transients through ultrathin gate oxides during plasma etching. Applied Physics Letters, 71 (14). pp. 1945-1947. ISSN 0003-6951. doi:10.1063/1.119989. https://resolver.caltech.edu/CaltechAUTHORS:HWAapl97b

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