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Hwang, Gyeong S. and Giapis, Konstantinos P. (1997) Prediction of multiple-feature effects in plasma etching. Applied Physics Letters, 70 (18). pp. 2377-2379. ISSN 0003-6951. doi:10.1063/1.118878. https://resolver.caltech.edu/CaltechAUTHORS:HWAapl97e

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