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Nakamura, K. and Lau, S. S. and Nicolet, M-A. et al. (1976) Ti and V layers retard interaction between Al films and polycrystalline Si. Applied Physics Letters, 28 (5). pp. 277-280. ISSN 0003-6951. http://resolver.caltech.edu/CaltechAUTHORS:NAKapl76

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