A Caltech Library Service

Browse by Eprint ID

Number of items: 1.

Giapis, Konstantinos P. and Scheller, Geoffrey R. and Gottscho, Richard A. et al. (1990) Microscopic and macroscopic uniformity control in plasma etching. Applied Physics Letters, 57 (10). pp. 983-985. ISSN 0003-6951. https://resolver.caltech.edu/CaltechAUTHORS:GIAapl90

This list was generated on Sun Mar 7 01:37:40 2021 PST.

CaltechAUTHORS is powered by EPrints 3.3 which is developed by the School of Electronics and Computer Science at the University of Southampton. More information and software credits.