A Caltech Library Service

Browse by Eprint ID

Up a level
Export as [feed] Atom [feed] RSS 1.0 [feed] RSS 2.0
Number of items: 1.

Giapis, Konstantinos P. and Scheller, Geoffrey R. and Gottscho, Richard A. et al. (1990) Microscopic and macroscopic uniformity control in plasma etching. Applied Physics Letters, 57 (10). pp. 983-985. ISSN 0003-6951. doi:10.1063/1.103532.

This list was generated on Tue Nov 29 17:39:24 2022 UTC.