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Giapis, Konstantinos P. and Scheller, Geoffrey R. and Gottscho, Richard A. et al. (1990) Microscopic and macroscopic uniformity control in plasma etching. Applied Physics Letters, 57 (10). pp. 983-985. ISSN 0003-6951. doi:10.1063/1.103532. https://resolver.caltech.edu/CaltechAUTHORS:GIAapl90

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