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Feng, Tao and Miller, Gerald and Atwater, Harry A. (2007) Charge retention characteristics of silicon nanocrystal layers by ultrahigh vacuum atomic force microscopy. Journal of Applied Physics, 102 (3). Art. No. 034305. ISSN 0021-8979. doi:10.1063/1.2764001. https://resolver.caltech.edu/CaltechAUTHORS:FENjap07

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