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Ting, D. Z.-Y. and Daniel, Erik S. and McGill, T. C. (1998) Interface Roughness Effects in Ultra-Thin Tunneling Oxides. VLSI Design, 8 (1-4). pp. 47-51. ISSN 1065-514X. doi:10.1155/1998/23567. https://resolver.caltech.edu/CaltechAUTHORS:TINvd98b

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