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Naeimi, Helia and DeHon, André (2008) Fault-tolerant sub-lithographic design with rollback recovery. Nanotechnology, 19 (11). p. 115708. ISSN 0957-4484. doi:10.1088/0957-4484/19/11/115708. https://resolver.caltech.edu/CaltechAUTHORS:NAEnanot08

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