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Items where Person is "Alty-H-R"

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Lewis, Scott M. and Hunt, Matthew S. and DeRose, Guy A. et al. (2019) Plasma-etched pattern transfer of sub-10 nm structures using a metal–organic resist and helium ion beam lithography. Nano Letters, 19 (9). pp. 6043-6048. ISSN 1530-6984.


Lewis, Scott M. and DeRose, Guy A. and Alty, Hayden R. et al. (2018) Design and implementation of the next generation electron beam resists for the production of EUVL photomasks. In: Photomask Technology 2018. Proceedings of SPIE. No.10810. Society of Photo-optical Instrumentation Engineers (SPIE) , Bellingham, WA, Art. No. 108100N. ISBN 9781510622159.


Lewis, Scott M. and Fernandez, Antonio and DeRose, Guy A. et al. (2017) Use of Supramolecular Assemblies as Lithographic Resists. Angewandte Chemie International Edition, 56 (24). pp. 6749-6752. ISSN 1433-7851.

This list was generated on Tue Oct 20 08:46:52 2020 PDT.