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Items where Person is "Gottscho-R-A"

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Jump to: 1993 | 1992 | 1991 | 1990
Number of items: 8.

1993

Nakano, T. and Giapis, K. P. and Gottscho, R. A. et al. (1993) Ion velocity distributions in helicon wave plasmas: Magnetic field and pressure effects. Journal of Vacuum Science and Technology B, 11 (6). pp. 2046-2056. ISSN 1071-1023. https://resolver.caltech.edu/CaltechAUTHORS:NAKjvstb93

Aydil, Eray S. and Zhou, Zhen and Giapis, Konstantinos P. et al. (1993) Real-time, in situ monitoring of surface reactions during plasma passivation of GaAs. Applied Physics Letters, 62 (24). pp. 3156-3158. ISSN 0003-6951. https://resolver.caltech.edu/CaltechAUTHORS:AYDapl93

Giapis, Konstantinos P. and Sadeghi, Nader and Margot, Joëlle et al. (1993) Limits to ion energy control in high density glow discharges: Measurement of absolute metastable ion concentrations. Journal of Applied Physics, 73 (11). pp. 7188-7194. ISSN 0021-8979. https://resolver.caltech.edu/CaltechAUTHORS:GIAjap93

Aydil, Eray S. and Giapis, Konstantinos P. and Gottscho, Richard A. et al. (1993) Ammonia plasma passivation of GaAs in downstream microwave and radio-frequency parallel plate plasma reactors. Journal of Vacuum Science and Technology B, 11 (2). pp. 195-205. ISSN 1071-1023. https://resolver.caltech.edu/CaltechAUTHORS:AYDjvstb93

1992

Yoon, Euijoon and Green, Christian A. and Gottscho, Richard A. et al. (1992) Latent image diffraction from submicron photoresist gratings. Journal of Vacuum Science and Technology B, 10 (5). pp. 2230-2233. ISSN 1071-1023. https://resolver.caltech.edu/CaltechAUTHORS:20120322-135630455

1991

Giapis, Konstantinos P. and Gottscho, Richard A. and Clark, Linda A. et al. (1991) Use of light scattering in characterizing reactively ion etched profiles. Journal of Vacuum Science and Technology A, 9 (3). pp. 664-668. ISSN 0734-2101. https://resolver.caltech.edu/CaltechAUTHORS:GIAjvsta91

1990

Giapis, Konstantinos P. and Scheller, Geoffrey R. and Gottscho, Richard A. et al. (1990) Microscopic and macroscopic uniformity control in plasma etching. Applied Physics Letters, 57 (10). pp. 983-985. ISSN 0003-6951. https://resolver.caltech.edu/CaltechAUTHORS:GIAapl90

Gottscho, Richard A. and Preppernau, Bryan L. and Pearton, Stephen J. et al. (1990) Real-time monitoring of low-temperature hydrogen plasma passivation of GaAs. Journal of Applied Physics, 68 (2). pp. 440-445. ISSN 0021-8979. https://resolver.caltech.edu/CaltechAUTHORS:20120424-091127667

This list was generated on Thu Oct 17 23:09:40 2019 PDT.