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Nam, S. W. and Gavalas, G. R. (1989) Stability of H_2-Permselective SiO_2 Films Formed by Chemical Vapor Deposition. In: Membrane reactor technology. AIChE symposium series. No.268. American Institute of Chemical Engineers , New York, NY, pp. 68-74. ISBN 9780816904648.

This list was generated on Thu Feb 25 17:57:57 2021 PST.