Published November 1997
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Chemically assisted ion beam etching of optical microresonators
Abstract
1-D, 2-D, 3-D microstructures with lateral dimensions at the scale of the wavelength of light can be used to generate high finesse microresonators. These have been fabricated in the AIMS system by combining MBE growth with micro-fabrication. Here we show the applications of anisotropicion beam etching and high resolution lithography in the fabrication of high-finesse micro-resonators and discuss their performance as lowthreshold microlasers, fast optical switches, photonic bandgap mirrors and polarizing beam-splitters.
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© 1997 IEEE. Issue Date: 10-13 Nov 1997; Date of Current Version: 06 August 2002.Attached Files
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