Microwave Near-Field Imaging of Two-Dimensional Semiconductors
Abstract
Optimizing new generations of two-dimensional devices based on van der Waals materials will require techniques capable of measuring variations in electronic properties in situ and with nanometer spatial resolution. We perform scanning microwave microscopy (SMM) imaging of single layers of MoS_2 and n- and p-doped WSe_2. By controlling the sample charge carrier concentration through the applied tip bias, we are able to reversibly control and optimize the SMM contrast to image variations in electronic structure and the localized effects of surface contaminants. By further performing tip bias-dependent point spectroscopy together with finite element simulations, we distinguish the effects of the quantum capacitance and determine the local dominant charge carrier species and dopant concentration. These results underscore the capability of SMM for the study of 2D materials to image, identify, and study electronic defects.
Additional Information
© 2015 American Chemical Society. Received: October 24, 2014; Revised: January 20, 2015; Published: January 27, 2015. We would like to thank Will Gannett, Mark Keller, and Alexandra Curtin for helpful advice on sample preparation. This material is based upon work performed by the Joint Center for Artificial Photosynthesis, a DOE Energy Innovation Hub, supported through the Office of Science of the U.S. Department of Energy under Award Number DE-SC0004993. Mention of commercial products is for informational purposes only, it does not imply NIST's recommendation or endorsement.Attached Files
Supplemental Material - nl504960u_si_001.pdf
Files
Name | Size | Download all |
---|---|---|
md5:cebb3399b219fe220d9edc8624b9c8e3
|
2.8 MB | Preview Download |
Additional details
- Eprint ID
- 56006
- Resolver ID
- CaltechAUTHORS:20150324-085931498
- Department of Energy (DOE)
- DE-SC0004993
- Created
-
2015-03-24Created from EPrint's datestamp field
- Updated
-
2021-11-10Created from EPrint's last_modified field
- Caltech groups
- JCAP