Fabrication techniques for high-performance Si heterojunction (SHJ) microcells
Abstract
Silicon heterojunction (SHJ) microcells offer a promising photovoltaic (PV) device for a wide range of micro-electronic applications due to their high performance potential. We examine two separate techniques for dicing SHJ microcells from bulk wafers: deep reactive ion etching (DRIE) and micro-laser cutting. We present the challenges and optimizations for each technique, as well as microcell performance for a 400µm x 400µm x 80µm microcell. Given the thickness of silicon wafers and the low face-to-edge area ratio for SHJ microcells of these dimensions, we consider varied illumination conditions for this structure. SHJ microcells are able to absorb photons along all surfaces; as such, we study microcell performance at each edge interface. We examine both modeled and experimental data of microcells across various lighting conditions and present high-performances for both sets of measurements.
Additional Information
© 2021 IEEE. This work was carried out with support from the "Photonics at Thermodynamic Limits" Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences under Award Number DE-SC0019140. Sciences Award Number DE-SC0019140.Additional details
- Eprint ID
- 111812
- DOI
- 10.1109/pvsc43889.2021.9518579
- Resolver ID
- CaltechAUTHORS:20211109-231356543
- Department of Energy (DOE)
- DE-SC0019140
- Created
-
2021-11-11Created from EPrint's datestamp field
- Updated
-
2021-11-11Created from EPrint's last_modified field