Published March 1995 | Version Published
Journal Article Open

Local order measurement in SnGe alloys and monolayer Sn films on Si with reflection electron energy loss spectrometry

  • 1. ROR icon California Institute of Technology

Abstract

Measurements of local order are demonstrated in Sn-containing alloys and epitaxial monolayer thickness films by analysis of extended-edge energy loss fine structure (EXELFS) data obtained by reflection electron energy loss spectrometry (REELS). These measurements of short-range order provide a complement to the chemical information obtained with REELS and long-range order obtained using reflection high energy electron diffraction. The results suggest that EXELFS measurements are practical for samples mounted on the growth manipulator in a molecular beam epitaxy chamber. Advantages and limitations of reflection EXELFS are discussed.

Additional Information

© 1995 American Vacuum Society. Received 28 March 1994; accepted 12 November 1994. This work was supported by the National Science Foundation (DMR-9202587).

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Eprint ID
12212
Resolver ID
CaltechAUTHORS:WONjvsta95

Funding

NSF
DMR-9202587

Dates

Created
2008-10-29
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Updated
2021-11-08
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