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Published July 2000 | Published
Journal Article Open

Fabrication of bismuth nanowires with a silver nanocrystal shadowmask


We fabricated bismuth (Bi) nanowires with low energy electron beam lithography using silver (Ag) nanocrystal shadowmasks and a subsequent chlorine reactive ion etching. Submicron-size metal contacts on the single Bi nanowire were successfully prepared by in situ focused ion beam metal deposition for transport measurements. The temperature dependent resistance measurements on the 50 nm wide Bi nanowires showed that the resistance increased with decreasing temperature, which is characteristic of semiconductors and insulators.

Additional Information

© 2000 American Vacuum Society. (Received 1 October 1999; accepted 3 January 2000) The authors gratefully acknowledge support by the Augmentation Awards for Science and Engineering Research Training (AASERT) Fellowship Grant No. N00014-96-1-1258, the Office of Naval Research MURI, and ARO MURI and the U.S. Air Force under Contract No. F04701-93-C-0094. One of the authors (J.R.H.) acknowledges the Office of Naval Research Contract No. N00014-981-0422, and the Packard Foundation. PAPERS FROM THE 46TH NATIONAL SYMPOSIUM OF THE AMERICAN VACUUM SOCIETY

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