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Published March 2001 | Published
Journal Article Open

Measuring and modeling optical diffraction from subwavelength features


We describe a technique for studying scattering from subwavelength features. A simple scatterometer was developed to measure the scattering from the single-submicrometer, subwavelength features generated with a focused ion beam system. A model that can describe diffraction from subwavelength features with arbitrary profiles is also presented and shown to agree quite well with the experimental measurements. The model is used to demonstrate ways in which the aspect ratios of subwavelength ridges and trenches can be obtained from scattering data and how ridges can be distinguished from trenches over a wide range of aspect ratios. We show that some earlier results of studies on distinguishing pits from particles do not extend to low-aspect-ratio features.

Additional Information

© 2001 Optical Society of America. Received January 5, 2000; revised manuscript received August 8, 2000; accepted August 21, 2000. This work was supported by the National Science Foundation Engineering Research Center for Neuromorphic Systems Engineering at California Institute of Technology.

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