Getter sputtering system for high-throughput fabrication of composition spreads

Creators: Gregoire, John M.; van Dover, R. B.; Jin, Jing; DiSalvo, Francis J.; Abruña, Héctor D.

Abstract

We describe a sputtering system that can deposit composition spreads in an effectively UHV environment but which does not require the high-throughput paradigm to be compromised by a long pump down each time a target is changed. The system deploys four magnetron sputter guns in a cryoshroud (getter sputtering) which allows elements such as Ti and Zr to be deposited with minimal contamination by oxygen or other reactive background gases. The system also relies on custom substrate heaters to give rapid heating and cool down. The effectiveness of the gettering technique is evaluated, and example results obtained for catalytic activity of a pseudoternary composition spread are presented.

Additional Information

© 2007 American Institute of Physics. Received 3 November 2006; accepted 13 February 2007; published online 13 July 2007. The authors wish to thank Mark Prochaska, Maxim Kostylev, Sara Barron, Sharon Gerbode, Paul Bishop, and John Sinnot for helpful conversations and general assistance in the construction of the deposition system. The WDS analysis was made possible by the Cornell Center for Materials Research Facilities supported by the National Science Foundation under Award No. DMR-0520404. Primary funding for this work is provided by the Department of Energy, Grant No. DE-FG02-03ER46072.

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