Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published February 1, 2012 | Published
Journal Article Open

Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities


In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38±31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q.

Additional Information

© 2012 Optical Society of America. Received October 4, 2011; revised December 12, 2011; accepted December 12, 2011; posted December 12, 2011 (Doc. ID 155915); published January 25, 2012. M. Gehl acknowledges support by the Department of Defense (DoD) through the National Defense Science & Engineering Graduate Fellowship (NDSEG) program. S. Zandbergen acknowledges partial support from Arizona Technology & Research Initiative Funding (TRIF). J. Hendrickson acknowledges support from the Air Force Office of Scientific Research (AFOSR)—LRIR 10RY04COR (Gernot Pomrenke, program manager). A. Homyk appreciates the generous support of the ARCS Foundation. A. Säynätjoki was supported by Academy of Finland grant 134087 and a travel grant by the Finnish Foundation for Technology Promotion. The Caltech and UofA groups thank NSF ERC CIAN (EEC-0812072) for support. The U of A group acknowledges support from the AFOSR (FA9550-10-1-0003) and NSF EPMD (ECCS-1101341).

Attached Files

Published - Gehl2012p17383J_Opt_Soc_Am_B.pdf


Files (569.3 kB)
Name Size Download all
569.3 kB Preview Download

Additional details

August 19, 2023
March 5, 2024