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Published May 10, 2010 | Supplemental Material
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NMR Chemical Shifts of Trace Impurities: Common Laboratory Solvents, Organics, and Gases in Deuterated Solvents Relevant to the Organometallic Chemist


Tables of ^1H and ^(13)C NMR chemical shifts have been compiled for common organic compounds often used as reagents or found as products or contaminants in deuterated organic solvents. Building upon the work of Gottlieb, Kotlyar, and Nudelman in the Journal of Organic Chemistry, signals for common impurities are now reported in additional NMR solvents (tetrahydrofuran-d_8, toluene-d_8, dichloromethane-d_2, chlorobenzene-d_5, and 2,2,2-trifluoroethanol-d_3) which are frequently used in organometallic laboratories. Chemical shifts for other organics which are often used as reagents or internal standards or are found as products in organometallic chemistry are also reported for all the listed solvents.

Additional Information

© 2010 American Chemical Society. Published In Issue May 10, 2010. Received February 11, 2010. Publication Date (Web): April 16, 2010. Article ASAP April 16, 2010. G.R.F. and K.I.G. thank the Department of Energy (Contract No. DE-FG02-06ER15765) for support. A.J.M.M. and J.E.B. thank the Moore Foundation for support. N.H.S. and B.M.S. thank Abbott Laboratories, Amgen, Merck, Bristol-Myers Squibb, Boehringer Ingelheim, the Gordon and Betty Moore Foundation, and Caltech for financial support.

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