Published July 2007
| Version Published
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Soft lithographic fabrication of microresonators
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Abstract
Using ultra-high-Q toroid microcavity masters, soft lithography is applied to fabricate polymer microcavity arrays with Q factors in excess of 10^6. This technique produces resonators with material-limited quality factors.
Additional Information
© Copyright 2007 IEEE. Reprinted with permission. Publication Date: 23-25 July 2007. The authors would like to thank Stevens Martin at AOC for the Vicast polymer resin used in this work. This work was supported by DARPA and the Caltech Lee Center. A.M.A is supported by a Clare Boothe Luce postdoctoral fellowship.Attached Files
Published - ARMleos07.pdf
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Additional details
Identifiers
- Eprint ID
- 11479
- Resolver ID
- CaltechAUTHORS:ARMleos07
Funding
- Defense Advanced Research Projects Agency
- Lee Center for Advanced Networking, Caltech
- Clare Booth Luce postdoctoral fellowship
Dates
- Created
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2008-08-28Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field