Welcome to the new version of CaltechAUTHORS. Login is currently restricted to library staff. If you notice any issues, please email coda@library.caltech.edu
Published November 26, 1990 | Published
Journal Article Open

Strain modification in coherent Ge and SixGe1–x epitaxial films by ion-assisted molecular beam epitaxy


We have observed large changes in Ge and SixGe1–x layer strain during concurrent molecular beam epitaxial growth and low-energy bombardment. Layers are uniformly strained, coherent with the substrate, and contain no dislocations, suggesting that misfit strain is accommodated by free volume changes associated with injection of ion bombardment induced point defects. The dependence of layer strain on ion energy, ion-atom flux ratio, and temperature is consistent with the presence of a uniform dispersion of point defects at high concentration. Implications for distinguishing ion-surface interactions from ion-bulk interactions are discussed.

Additional Information

© 1990 American Institute of Physics (Received 25 May 1990; accepted 30 August 1990) The work was supported by the National Science Foundation P.Y.I.A. program (DMR-8958070) and the Materials Research Group program (DMR-8811795).

Attached Files

Published - TSAapl90.pdf


Files (610.5 kB)
Name Size Download all
610.5 kB Preview Download

Additional details

August 22, 2023
October 16, 2023