Lithographic Patterning of Photoreactive Cell-Adhesive Proteins
Abstract
We describe a novel, simple method for the photolithographic patterning of cell-adhesive proteins. Intrinsically photoreactive proteins are synthesized in Escherichia coli through incorporation of the non-canonical, photosensitive amino acid para-azidophenylalanine. Upon ultraviolet irradiation at 365 nm, proteins form cross-linked films with elastic moduli that can be tuned by varying the concentration of photoreactive amino acid in the expression medium. Films of these proteins can be directly patterned using standard photolithographic techniques. We demonstrate the utility of this method of protein patterning by creating stable arrays of fibroblast cells on an engineered protein "photoresist".
Additional Information
Copyright © 2007 American Chemical Society. Received January 10, 2007 . Publication Date (Web): March 31, 2007. Published In Issue April 25, 2007. We thank Michael Diehl, Alireza Ghaffari, and Nandita Sharma for helpful discussion, and Kechun Zhang for help in preparing the patterned substrates. Supported by the NSF Center for the Science and Engineering of Materials at Caltech, NIH GM62523 and EB01971, an NIH predoctoral fellowship to S.A.M., a Whitaker Graduate Fellowship to J.C.L., and the Joseph J. Jacobs Institute for Molecular Engineering for Medicine.Attached Files
Supplemental Material - ja070200bsi20070110_070449.pdf
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Additional details
- PMCID
- PMC2533112
- Eprint ID
- 53698
- DOI
- 10.1021/ja070200b
- Resolver ID
- CaltechAUTHORS:20150114-104001187
- NSF
- GM62523
- NIH
- EB01971
- NIH
- NIH Predoctoral Fellowship
- Whitaker Graduate Fellowship
- Joseph J. Jacobs Institute for Molecular Engineering for Medicine
- Created
-
2015-01-14Created from EPrint's datestamp field
- Updated
-
2021-11-10Created from EPrint's last_modified field
- Caltech groups
- GALCIT