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Published August 13, 2002 | public
Journal Article

Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results


Three metal-catalyzed vinyl addition copolymers derived from partially fluorinated norbornenes and tricyclononenes have been synthesized and evaluated for use in formulating photoresists for 157 nm lithography imaging. The transparency of these polymers at 157 nm, as measured by variable angle spectroscopic ellipsometry (VASE), is greatly improved over their nonfluorinated counterparts. The results of preliminary lithographic evaluations of resists formulated from these polymers alone and with the addition of several new fluorinated dissolution inhibitors are presented. Images as small as 70 nm have been printed in some formulations.

Additional Information

© 2002 American Chemical Society. Received 26 December 2001. Published online 11 July 2002. Published in print 1 August 2002. The authors gratefully acknowledge International SEMATECH for financial support of this work. AZ Clariant is acknowledged for donation of key starting materials and photoacid generators. We are indebted to JSR Corp. for support of Mr. Chiba and Shipley Co. for support of Dr. Yamada. SEMATECH employees Danny Miller, Shashi Petel, Vicky Graffenberg, and Georgia Rich are all acknowledged for their help with the imaging work.

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